SCW600S
TMD layer deposition
Cold Wall CVD System for Transition Metal Dichalcogenides (TMD)
Advantage of SCW600S
- Larger area to grow TMDs
- Consistent surface morphology
- Stable process through vapor precursor
- Automatic operation
- Wafer-scaled growth area in 6-inch
- Excellent uniformity for the whole wafer with monolayer film
